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showing 1 - 4 of 4
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Ultra T Cleaner Model: SWC111M
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This cleaning system removes all types of particles from a variety of substrates (wafer, photo masks, FPD, optical disks, etc). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray.
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Inquire
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Ultra T Cleaner Model: SWC111M(2)
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This cleaning system removes all types of particles from a variety of substrates (wafer, photo masks, FPD, optical disks, etc). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray.
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Inquire
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Verteq 1600 SRD Spin Rinse Dryer
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A single stack, low paticulate spin rinse dryer that accommodates wafers 4" to 6".
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Inquire
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Verteq 1800-6AR Mobile Single Stack SRD
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A single stack, spin rinse dryer that is configured for 8" wafers.
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Inquire
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showing 1 - 4 of 4
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