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showing 1 - 15 of 15
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KLA-Tencor / Prometrix FT-750 Wafer Film Thickness Measurement System
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A film thickness probe that accommodates wafer sizes from 100mm - 200mm.
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Inquire
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KLA-Tencor / Prometrix RS35C Resistivity Mapping System (2)
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The OmniMap collects and analyzes sheet resistance data on various conductive layers such as implants, diffusions, epi, CVD, metals and bulk substrates.
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Inquire
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KLA-Tencor / Prometrix RS50(E) Resistivity Mapping System
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A tool with all the basic functions of a 4-point probe, plus contour and 3-D mapping output. It also has trend charts in order to track process and equipment performance.
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Inquire
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KLA-Tencor / Prometrix RS55/TC Resistivity Mapping System
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OmniMap four point probe resistivity mapping system for sheet resistance process control. Accommodates wafer sizes: 2"-8". This system includes temperature compensation (TC) hardware.
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Inquire
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KLA-Tencor / Prometrix RS55/TC Resistivity Mapping System (2)
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OmniMap four point probe resistivity mapping system for sheet resistance process control. Accommodates wafer sizes: 2"-8". This system includes temperature compensation (TC) hardware.
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Inquire
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KLA-Tencor ASET-F5x Thin Film Metrology System
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This thin film metrology system measures across a continuous wavelength spectrum from 190nm to 800nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry. The ASET-F5x also provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron.
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Inquire
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KLA-Tencor OmniMap RS100 Resistivity Mapping System
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KLA-Tencor's OmniMap RS-100 - System capable of running 200mm and 300mm wafers. RS-100 has the ability to measure materials such as polysilicon, copper and bulk silicon substrates.
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Inquire
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KLA-Tencor Surfscan 4500 Particle Inspection Analyzer
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Laser-based system that scans the entire substrate surface, producing color coded graphic displays and hardcopy printouts of particles locations.
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Inquire
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KLA-Tencor UV-1050
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A system designed for thin film measurement. It can be configured for multiple wafer sizes up to 200mm.
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Inquire
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Rudolph Research Auto EL III Ellipsometer
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The Auto EL III is an ellipsometer designed to provide precise film thickness measures. This tool has a non-volatile memory, allowing users to retrieve previously determined sample parameters. The system's thermal printer can provide a hard copy of the results as well.
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Inquire
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Rudolph Research Auto EL IV Ellipsometer
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The Auto EL IV is an ellipsometer designed to provide precise film thickness measures. This tool has a non-volatile memory, allowing users to retrieve previously determined sample parameters. The system's thermal printer can provide a hard copy of the results as well.
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Inquire
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Rudolph Research Auto EL IV Ellipsometer (2)
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The Auto EL IV is an ellipsometer designed to provide precise film thickness measures. This tool has a non-volatile memory, allowing users to retrieve previously determined sample parameters. The system's thermal printer can provide a hard copy of the results as well.
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Inquire
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Rudolph Research FE-III Focus Ellipsometer
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The Rudolph FE-III Focus Ellipsometer is a fully automated, high speed, focused beam ellipsometer designed for the semiconductor production environment. It handles 4" to 8" wafers. This tool has a fully automated site by site sample alignment and automatic feature recognition.
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Inquire
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Rudolph Research FE-III Focus Ellipsometer (2)
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The FE-III Focus Ellipsometer is a fully automated, high speed, focused beam ellipsometer designed for the semiconductor production environment. It couples quality and accuracy with the automation, small spot size, speed, and cleanliness required for semiconductor processing.
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Inquire
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Rudolph Research FE-IIID Focus Dual Wavelength Ellipsometer
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The Rudolph FE III Focus Ellipsometer is designed to provide precision film thickness measurements with simplicity of use. The FE IIID's advanced Focused Beam system uses dual wavelength technology to directly measure the sample with a small spot at multiple angles of incidence and at multiple wavelengths. This allows the system to define more variables, increasing the certainty of the results on complex multi-layer films.
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Inquire
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showing 1 - 15 of 15
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